 The MultiProbe™ Atomic Force (AFP) combines the lowest noise electrical probing with atomic force microscopy, resulting in the world’ highest resolution probing tool. The AFP is ideal for imaging and contacting deep submicron structures. It features piezoelectric nano-positioning and force feedback to deliver high-resolution maps of nanometer-sized surface structures, and the ability to place up to 6 probes on desired nodes, quickly and with controlled force. The AFP is designed to use ultra-sharp tungsten needles to give the probes an extended lifetime for both imaging and probing. The MultiProbe AFP has been acclaimed for its ability to extract properties at every possible stage of the process, from silicide to final metallization.  Engineers that use the AFP for Failure Analysis report that it has reduced FA processes to such a degree, that, what previously took a week's worth of additional process steps to accomplish, now requires as little time as it takes to pull a wafer at contact or silicide level. How valuable would it be to measure properties, one month, one week or even one day sooner?
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Failure Analysis 
