Trion Technology, Plasma Etch and Deposition Systems Manufactures a wide variety of systems for the Compound Semiconductor, MEMS, Opto-Electronic and other markets. Our products feature the smallest footprint and lowest cost systems in the industry with proven production reliability. If you wish anything from full-blown production cluster tools to a simple laboratory system, Trion makes it.  Sirus T2 Table Top Reactive Ion Etch (RIE) System The Sirus T2 Reactive Ion Etcher is a basic plasma etching system designed to etch dielectrics and other films that require fluorine-based chemistries. The small footprint and robust design make it ideal for the lab environment. 
Phantom III (RIE) system The Phantom III RIE is designed for etching nitrides, oxides and any films or substrates requiring fluorine-based chemistry. It's modular design, mounted on a space-saving platform, is the system of choice for many users throughout the world. For further information, please visit http://www.triontech.com
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